Structural and Chemical Characterization

ACMAL

ACMAL

The Applied Chemical and Morphological Analysis Laboratory (ACMAL), managed by the Department of Materials Science and Engineering, is a University Core Facility and member of the Michigan Tech Materials Characterization and Fabrication Facilities. Lab research activities include characterizing materials and studying the chemistry of materials at the atomic level. ACMAL houses an extensive array of electron microanalytical and x-ray instruments. Five discrete facilities featuring state-of-the-art equipment comprise the ACMAL:

  • The Electron Optics Facility offers two scanning electron microscopes (SEM), a high-resolution transmission electron microscope (TEM), and a focused ion beam milling system (FIB).
  • The X-Ray Facility offers an energy-dispersive x-ray fluorescence spectrometer and five x-ray diffractometers.
  • The Scanning Probe Microscopy Facility offers scanning tunneling microscopy (STM) and an atomic force microscope (AFM).
  • The Surface Analysis Facility offers a scanning Auger microprobe for Auger electron spectroscopy (AES).
  • The Fluorescence Optical Microscopy Facility offers two optical microscopes and digital cameras.

ACMAL Rooms Location
Auger Spectrometer M&M 615
Atomic Force Microscope M&M 616
Ultramicrotome M&M 617
X-Ray Diffraction M&M 629
X-Ray Fluorescence M&M 630
Image Analysis M&M 631
Focused Ion Beam System M&M 632
High Resolution Transmission Electron Microscope M&M 633
Scanning Electron Microscope M&M 635
Field Emission Scanning Electron Microscope M&M 636
Electron Microscope Sample Preparation M&M 637
Environmental Scanning Electron Microscope M&M 717

ACMAL Rooms Contact: Owen Mills

Labs and Equipment Location Contact
Varied Sample Preparation Techniques M&M 637 Owen Mills
Optical Microscopy and Metallography M&M U107 Daniel Seguin
Image Analysis and Processing M&M 631 Owen Mills
Powder Characterization M&M 532 Paul Fraley
Encapsulation/Glass Working Station   Paul Fraley
Xenon Lamp   Paul Fraley
LECO Light Element Chemical Analyses M&M U109 Daniel Seguin
X-Ray Diffraction M&M 629 Edward Laitila